Figure 1. (a) In situ UV-vis absorption measurement device schematic illustration. Reproduced from [67]. (b) Schematic diagram of in situ PL experimental facility. Reproduced from [74]. (c) Schematic illustration of in situ GISAXS/GIWAXS measurements device. Reproduced from [81].
The above several in-situ characterization methods are more commonly used techniques, which can well characterize the evolution of thin films, facilitate us to better understand the crystallization dynamics, and then find regulatory means to optimize the morphology. The principles of film-forming dynamics and the regulation of film-forming and post-annealing processes will be introduced next.