Figure 1. (a) In situ
UV-vis absorption measurement device schematic illustration. Reproduced
from [67]. (b) Schematic diagram of in situ PL experimental
facility. Reproduced from [74]. (c) Schematic illustration of in
situ GISAXS/GIWAXS measurements device. Reproduced from [81].
The above several in-situ characterization methods are more commonly
used techniques, which can well characterize the evolution of thin
films, facilitate us to better understand the crystallization dynamics,
and then find regulatory means to optimize the morphology. The
principles of film-forming dynamics and the regulation of film-forming
and post-annealing processes will be introduced next.