Conclusion

We were able to learn some valuable information about the characteristics of sputtered ITO films. We have determined the dependance of the deposition rate on the sputtering parameters. The transmittance changes only in small amounts within our experiment design space; this indicates that it may not be necessary to consider transmittance as a response for which to optimise the sputtering process. In contrast, the resistivity can change by a couple of orders of magnitude, depending on the parameters. We determined which factors have relevant effects, but also noticed that some interactions are non negligible. As our fractional factorial design does not allow to distinguish between main effect and first order interaction, future work should include a set of additional experiments, carefully chosen in order to de-aliase our results.