Nikolai Desch ORCID iD: 0000-0002-0384-8248
Markus Lake ORCIC iD: 0000-0002-3535-8454
Formation of pure anatase TiO2 by reactive pulsed dc magnetron sputtering
Method for controlling target poisoning state
Nikolai Desch1*, Markus Lake1
1 Hochschule Niederrhein, Reinarzstraße 49, 47805 Krefeld, Germany
*corresponding author: + 49 2151 822-5086 | nikolai.desch@hs-niederrhein.de
Keywords: reactive sputtering, dc magnetron sputtering (DC-MSIP), pulsed magnetron sputtering (PMS), oxygen, target poisoning, magnetron sputter ion plating, TiO2, anatase