The Raman analysis of the coatings was performed with a Renishaw InVia Raman spectroscope, and a green laser with a wavelength of 532 nm and a laser power of 0.75 mW was used. All titanium dioxide coatings were produced on the Metaplas Domino.Mini industrial PVD coating system. In this work, pulsed DC-MSIP is the applied coating technology. The titanium target used has a size of 456 mm x 81 mm x 10 mm and is made of 99.999 % pure titanium. A sputtering power of 7.0 kW was applied for all experiments, which corresponds to a power density of approximately 19 W/cm². Argon with a purity of 99.999 % was used as the process gas. The reactive gas oxygen has a purity of 99.998 %. Conventional slides were used as substrate material (soda-lime float glass slides 76 mm x 26 mm x 1.5 mm) and the maximum substrate temperature was recorded using a drag gauge thermometer. The magnetic field strength perpendicular to the target was 24.9 mT. For the coating experiment, the glass slides were ultrasonically cleaned in technical ethanol (96 %) for 10 minutes and the cleaned slides were subsequently charged on the substrate table. After loading the coating chamber, the chamber was evacuated to a starting vacuum of 4.0 x 10-3 Pa. Afterwards, without additional heating, an argon-ion sputter etching was performed for 15 minutes. Following the etching process, the coating process was carried out using the reactive pulsed magnetron sputtering method, also without additional heating. The turbomolecular pump (Turbovac Mag W 1600 iP) was kept constant at 25,200 rpm during the coating experiment. All coating experiments were operated in power-constant mode with 7.0 kW dc pulsed sputtering power. For all experiments, the applied pulse parameters were kept constant. Figure 1 shows the voltage (a) and current (b) curves during the PMS process, recorded with a Tektronix TDS 2001C oscilloscope, measured at the Advanced Energy Pinnacle Plus+ power source on the Metaplas Domino.Mini coating system. The applied pulse frequency was 350 kHz with a switch-on time (ton) of 1.7 μs and the switch-off (𝑡off) in this case was 1.1 μs. The pulse duration T was 2.8 μs. The switch-on time corresponds to a 60 % duty cycle (ton /ton+toff). Further detailed explanations of the pulsed dc mode can be found in [12–14].