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\begin{document}

\title{Study on pseudospark switch with high repetition frequency with
double-pulse triggering}



\author[1]{d wj}%
\author[2]{Jinjun Feng}%
\affil[1]{Beijing Vacuum Electronic Technology Co Ltd}%
\affil[2]{National Key Laboratory of Science and Technology on Vacuum Electronics}%


\vspace{-1em}



  
  \date{May 18, 2024}


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\selectlanguage{english}
\begin{abstract}
The pseudospark switch works in the left branch of Paschen curve with
low gas pressure, which has the advantage of short electrode breakdown
time (\textless{}10ns), large pulse current (\textgreater{}100kA), and
long lifetime, etc. High pulse repetition frequency (PRF) pseudospark
switch has important applications in food processing, sewage treatment,
high energy laser system, sonar syste, and other fields, the pseudospark
switch with a PRF of kHz-level is needed. This paper focuses on the
pseudospark switch with double-pulse trigger structure, and the
corresponding relationship between the two trigger voltages and current
is calculated respectively, and the influence of the two pulses on the
trigger process is analyzed. Then the pseudospark switch with this
structure is tested with the anode voltage of 10kV for different voltage
and gas pressure. The results show that the minimum trigger voltage is
only 100V, and the switch can work stably with high repetition
frequency.%
\end{abstract}%



\sloppy


Study on pseudospark switch with high repetition frequency with
double-pulse triggering

\textbf{Ding Wenjing, Feng Jinjun, Zhang Ming, Yang Hongfei}

Vacuum Electronics Research Institute, Beijing 100015, China

Email: fengjinjun@tsinghua.org.cn

Abstract text. The pseudospark switch works in the left branch of
Paschen curve with low gas pressure, which has the advantage of short
electrode breakdown time (\textless{}10ns), large pulse current
(\textgreater{}100kA), and long lifetime, etc. High pulse repetition
frequency (PRF) pseudospark switch has important applications in food
processing, sewage treatment, high energy laser system, sonar syste, and
other fields, the pseudospark switch with a PRF of kHz-level is needed.
This paper focuses on the pseudospark switch with double-pulse trigger
structure, and the corresponding relationship between the two trigger
voltages and current is calculated respectively, and the influence of
the two pulses on the trigger process is analyzed. Then the pseudospark
switch with this structure is tested with the anode voltage of 10kV for
different voltage and gas pressure. The results show that the minimum
trigger voltage is only 100V, and the switch can work stably with high
repetition frequency.

\emph{Introduction:} In engineering practice and scientific research,
the increasing development of pulse power technology also requires the
subsequent progress of switching devices, especially in the field of
high PRF has urgent application needs and huge space for development,
such as in the military field, for underwater communication and
underwater confrontation, the need for 10 kHz to 100 kHz with sonic high
repetition frequency switches. High power and high repetition frequency
switches of GW class kHz are also required in high energy laser
weapons{[}1{]}. In daily life and industrial production, high pulse
repetition frequency switches can greatly improve work efficiency in
sewage treatment, food processing and other fields{[}2-3{]}. The
existing pulse power technology switches include solid switches,
thyratron switches, field distortion switches, pseudospark switches and
so on. However, only the pseudospark switch can combine high power and
high PRF performance. In the Z-pinch nuclear fusion device, the
pseudospark switch is the only switch with PRF operation
capability{[}4{]}. Therefore, the pseudospark switch with high
repetition frequency is one of the leading directions of the development
of high power pulse field in the world.

\emph{Double-pulse triggering structure:} V.D. Bochkov et al. {[}5-6{]}
of the Russian Institute of High Current Electronics developed a series
of commercial high repetition frequency pseudospark switches (TPI type).
All of them adopt the structure of glow discharge and double-pulse
triggering, and the PRF reaches 20kHz.

Based on the electrode structure of glow discharge and double-pulse
trigger {[}7{]}, we designed the high PRF pseudospark as shown in Figure
1(a), which is composed of hollow anode, grid, hollow cathode and glow
trigger structure, and the trigger structure includes auxiliary glow
discharge anode, auxiliary emission electrode and Faraday cup, its photo
shown in Figure 1(b). Dual pulse triggering is divided into main-trigger
voltage U\textsubscript{tcp1} and pre-trigger voltage
U\textsubscript{tcp2}. The U\textsubscript{tcp2} is applied to the
auxiliary glow discharge anode, and the U\textsubscript{tcp1} is to the
grid. The electronic path is shown in the arrow in Figure 1(a). In order
to verify the effectiveness of double-pulse triggering and the influence
of pre-trigger and main trigger pulses on the discharge process, this
paper tests the pulse repetition frequency performance of the structure
under different gas pressure and trigger voltage, and simulates the
trigger unit to observe the influence of different trigger voltages on
the cathode current.\selectlanguage{english}
\begin{figure}[H]
\begin{center}
\includegraphics[width=0.70\columnwidth]{figures/image1/image1}

\end{center}
\end{figure}

(a) structure

\par\null

(b) picture of products

\textbf{Fig 1} Glow discharge - double pulse triggering pseudospark
switch: (a) structure; (b) picture of products

\emph{PRF influenced by pre-trigger voltage U\textsubscript{tcp2}:}Based
on the anode voltage E\textsubscript{a}=10kV, the influence of the
pre-trigger voltage U\textsubscript{tcp2} on the PRF is obtained, as
shown in Figure 2.

As shown in Figure 2(a), when the main trigger voltage is low
U\textsubscript{tcp1}=0.3kV, increasing the U\textsubscript{tcp2} can
significantly improve the pulse repetition frequency characteristics.
The application of the U\textsubscript{tcp2} corresponds to the process
of initial electron generation. The larger the trigger voltage, the
stronger the spatial electric field, the faster the electron migration
rate, the more intense the collision ionization, while the faster the
hollow cathode effect is generated. When the main trigger voltage is
higher U\textsubscript{tcp1}=1kV, as shown in Figure 2(b), increasing
the U\textsubscript{tcp2} at this time has almost no impact on the PRF
performance.\selectlanguage{english}
\begin{figure}[H]
\begin{center}
\includegraphics[width=0.70\columnwidth]{figures/image3/image3}

\end{center}
\end{figure}

(a) U\textsubscript{tcp1}=0.3kV\selectlanguage{english}
\begin{figure}[H]
\begin{center}
\includegraphics[width=0.70\columnwidth]{figures/image4/image4}

\end{center}
\end{figure}

(b) U\textsubscript{tcp1}=1kV

\textbf{Fig 2} The influence of different
U\textsubscript{tcp2}(0.3kV\begin{CJK}{UTF8}{gbsn}、\end{CJK}\selectlanguage{english}0.5kV\begin{CJK}{UTF8}{gbsn}、\end{CJK}\selectlanguage{english}1kV) on PRF: (a)
U\textsubscript{tcp1}=0.3kV; (b)U\textsubscript{tcp1}=1kV

For this reason, simulation verification is carried out for the case of
higher main trigger voltage U\textsubscript{tcp1}. Figure 3 shows when
the U\textsubscript{tcp1} is 1kV, the influence of different pre-trigger
voltages U\textsubscript{tcp2} (0.3kV, 0.5kV, 1kV) on the trigger
current. Appropriately increasing the U\textsubscript{tcp2} (from 0.3kV
to 0.5kV) can improve the current growth rate. However, continuing to
increase the U\textsubscript{tcp2} to 1kV corresponds to the current
rise speed can be seen to decrease. This is because when the
U\textsubscript{tcp2} = 0.5kV, the current is close to saturation, and
further increase of the U\textsubscript{tcp2} at this time will cause
some electrons to be directly pumped to the anode, resulting in the
weakening of impact ionization and the weakening of current.\selectlanguage{english}
\begin{figure}[H]
\begin{center}
\includegraphics[width=0.70\columnwidth]{figures/image5/image5}

\end{center}
\end{figure}

\textbf{Fig 3} When the U\textsubscript{tcp1}= 1kV, trigger current
influenced by the U\textsubscript{tcp2} (0.3kV, 0.5kV, 1kV)

\emph{PRF influenced by main-trigger voltage U\textsubscript{tcp1}:}When
the gas pressure is fixed at 50Pa and the anode voltage
E\textsubscript{a}=10kV, the variation diagram of the repetition
frequency with the U\textsubscript{tcp1} (0-5kV) is obtained at
different U\textsubscript{tcp2} (0.5kV, 1kV, 1.5kV), as shown in Figure
4.\selectlanguage{english}
\begin{figure}[H]
\begin{center}
\includegraphics[width=0.70\columnwidth]{figures/image6/image6}

\end{center}
\end{figure}

\textbf{Fig 4} Under different U\textsubscript{tcp2} (0.5kV, 1kV,
1.5kV), the PRF changes with the U\textsubscript{tcp1}

When the main trigger voltage U\textsubscript{tcp1}[?]0.3kV, PRF
performance significantly improves with the increasing of
U\textsubscript{tcp2} (from 0.5kV to 1.5kV), while when the
U\textsubscript{tcp1} [?]0.8kV, the U\textsubscript{tcp2} has little
effect on the PRF. It can be seen that the lower
U\textsubscript{tcp2}is, a higher U\textsubscript{tcp1} is needed to
improve the initial plasma concentration. Conversely, when the
U\textsubscript{tcp2}increase, the initial plasma concentration is large
enough, and it will just need a very small U\textsubscript{tcp1} to pump
the initial plasma to the main gap. For example, under the
U\textsubscript{tcp2}=1.5kV, only 100V main trigger voltage allows the
switch to operate stably at 400Hz. After testing and verification, the
U\textsubscript{tcp1} can maintain the 400Hz PRF in the larger range of
0.1\textasciitilde{}5kV.

\emph{Conclusion:} In this paper, the double-pulse triggering glow
discharge structure is used to realize the high PRF pseudospark, and the
test is carried out under different gas pressure, pre-trigger voltage
and main-trigger voltage respectively. The results shows the minimum
trigger voltage required to achieve stable trigger is about 100V,
according to the test results, the simulations, about under different
gas pressures, the influence of two trigger voltages on the current,
carried out. Finally, combined with the simulation and test results, the
influence of pre-trigger and main trigger voltage on the discharge
process is summarized respectively, that is, the initial plasma is
generated by pre-trigger voltage, and the main trigger pulse is
responsible for pumping plasma into the main gap.

\textbf{Reference}

\begin{enumerate}
\tightlist
\item
  A V Akimov, P V Logachev, V D Bochkov, et al. Application of
  TPI-thyratrons in a double-pulse mode power modulator with
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  Insulation, IEEE Transactions on, 2010, Vol.17(3): 716-720.
\item
  Bochkov, Victor D;Bochkov, Dmitri V.;Gnedin, Igor N.;Vasiliev, Gleb
  M.;Vasetskiy, Vladimir A.;Zhdanok, Sergei A..High voltage pulse
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\item
  Bochkov, V. D;Bochkov, D. V.;Dyagilev, V. M.;Panov, P. V.;Teryoshin,
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\item
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\item
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\item
  Bochkov V D, Dyagilev V M, Ushich V G, et al. Sealed-off pseudospark
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\item
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\end{enumerate}

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